|
Name
|
single
room
|
Arrival
|
Departure
|
Affiliation
|
Title
|
|
ABE Yoshimi |
1 |
17 |
20 |
Center for Analytical Chemistry and Science,Inc. |
|
|
AZUMA Yasushi |
1 |
17 |
20 |
Materials Characterization Division, Surface and Thin Film Standards Section, NMIJ, AIST |
Thickness measurement by GIXRR and XPS for establishment of thin film standard |
|
CHOI IL-SANG |
1 |
17 |
20 |
HYNIX SEMICONDUCTOR INC. SYSIC R&D Devision |
Characterization of interface between Al2O3/Si using X-ray photoelectron spectroscopy |
|
DOHMAE Kazuhiko |
1 |
17 |
20 |
TOYOTA Central R&D Labs., INC. |
|
|
FUKUDA Yasuo |
1 |
17 |
19 |
Shizuoka University |
|
|
FUKUSHIMA Sei |
1 |
17 |
20 |
National Institute for Materials Science |
|
|
GOTO Keisuke |
1 |
17 |
20 |
Nagoya Institute of Technology |
|
|
HASHIMOTO Satoshi |
1 |
17 |
20 |
Kokan Keisoku K.K. |
Change of Ti2p XPS spectrum for Titanium Oxide by Ar Ion Bombardment |
|
HIBI Takaaki |
0 |
17 |
20 |
Department of Material and Life Science, Graduate School of Engineering, Osaka University |
|
|
HOMMA Yoshikazu |
1 |
18 |
19 |
NTT Basic Research Laboratories |
Evaluation of BN-delta-doped multilayers as the reference material for SIMS shallow depth profiling |
|
IIDA Shin-ichi |
0 |
17 |
20 |
Osaka University |
Surface Properties of Sc-O/W(100) System as Emitter at Room and High Temperatures |
|
ISHIZU NORIKO |
0 |
17 |
20 |
Matsushita Technoresearch,Inc. |
|
|
JO Masatoshi |
1 |
17 |
20 |
National Metrology Institute of Japan, AIST |
|
|
KATO Jumpei |
0 |
17 |
20 |
Department of Material and Life Science, Graduate School of Engineering, Osaka University |
|
|
KAWAI Jun |
1 |
19 |
20 |
Kyoto University, Department of Materials Science and Engineering |
|
|
KIM KYUNGJOONG |
1 |
17 |
20 |
Korea Research Institute of Standards and Science |
Certified Reference Materials for SIMS Depth Profiling |
|
KIM Hyun Kyong |
1 |
17 |
19 |
Korea Research Institute of Standards and Science |
Report of SIMS depth profiling RRT in Korea with delta BN multilayers in Si |
|
KIMURA Takashi |
1 |
17 |
20 |
NIMS Material Analysis Station |
|
|
KOIZUMI Ayumi |
0 |
17 |
20 |
Shinko Electric Industries Co., Ltd. |
|
|
KANG Hee Jae |
1 |
17 |
20 |
Department of Physics, Chungbuk National University |
Damage distribution in Si surface by low energy Ar ion sputtering |
|
LEE Jong-Wan |
1 |
17 |
20 |
Hallym University, Dept. of Physics |
SIMS deconvolution of delta layers in silicon |
|
LEE Yeonhee |
1 |
17 |
20 |
Korea Institute of Science and Technology |
Surface Properties and Characterization of PSII-modified Polymers |
|
LEE Jae Cheol |
1 |
17 |
20 |
Analytical Engineering Center Samsung Advanced Institute of Technology (SAIT) |
|
|
MIURA Kaoru |
0 |
0 |
0 |
Tokuyama Corp. RC Research Laboratory |
|
|
MOON Dae Won |
1 |
17 |
20 |
Korea Research Institute of Standards and Science |
Standardization of shallow junction profiling with MEIS and low energy SIMS |
|
NAGATOMI Takaharu |
1 |
17 |
20 |
Department of Material and Life Science, Graduate School of Engineering, Osaka University |
|
|
NAKAMURA Makoto |
1 |
17 |
20 |
FUJITSU Laboratory Ltd.ˇˇ |
|
|
OGIWARA TOSHIYA |
1 |
18 |
20 |
NTT Advanced Technology Corporation |
|
|
OHARA SHINICHIROU |
0 |
18 |
20 |
Fuji Photo Film Co. Fujinomiya Research Lab. |
|
|
OHMURA Takuichi |
0 |
17 |
19 |
Matsushita Technoresearch,Inc. |
|
|
ORIKASA Hitoshi |
0 |
17 |
20 |
Fuji Electric Corporate Research and Development |
|
|
PARK Yongsup |
1 |
17 |
20 |
Korea Research Institute of Standards and Science |
Alq3-based OLED with Al/fluoride Cathode: Performance Enhancement and Interface Electronic Structures |
|
SAKAI YUJI |
0 |
17 |
20 |
JEOL Ltd. Sales Management Division |
|
|
SATO KAZUHIKO |
0 |
17 |
20 |
Teijin Ltd. Polymer Research Institute |
|
|
SATOU Michiko |
0 |
17 |
20 |
Fujitsu Analysis Laboratory Ltd. |
|
|
SHIN-YA Ryuji |
1 |
17 |
20 |
Sumitomo Metal Technology INC. |
|
|
SHIRATORI Tsubasa |
0 |
18 |
20 |
Utsunomiya University |
|
|
SUZUKI Noboru |
1 |
17 |
20 |
Utsunomiya University |
|
|
SUZUKI Mineharu |
1 |
17 |
20 |
NTT Advanced Technology Corporation |
Development of Sample Holder for Surface Degradation Estimation during XPS Measurement |
|
TAKAHASHI Kazuhiro |
0 |
17 |
20 |
Kratos Analytical Ltd. Japan Branch |
|
|
TAKANO MIDORI |
0 |
17 |
20 |
Matsushita Technoresarch,Inc. |
|
|
TANAKA Akihiro |
1 |
17 |
20 |
ULVAC-PHI, Incorporated |
Angular Distribution of Photoelectrons measured with DAPHNIA |
|
TOUJOU Fumiyo |
0 |
18 |
20 |
Matsushita Technoresearch, Inc. |
|
|
TANUMA Shigeo |
1 |
17 |
20 |
NIMS-MAS |
Development of evaluation method of specimen damage due to electron irradition on AES analysis |
|
TOHMA Hajime |
1 |
17 |
20 |
NISSAN ARC,LTD. |
Study of Degradation during XPS using New Holders |
|
YAMAUCHI Kyoko |
0 |
18 |
20 |
NSG Techno-Research Co., Ltd. |
|
|
YANAGIUCHI Katsuaki |
1 |
17 |
20 |
TDK Corporation |
A Practical Procedure For Surface Protection of a Bulk Specimen in the Air |
|
YASUFUKU HIDEYUKI |
0 |
17 |
20 |
National Institute for Materials Science |
Development of X-ray photo-emission electron microscopy (XPEEM) at SPring-8 BL15XU |
|
YOSHIHARA Kazuhiro |
1 |
17 |
20 |
National Institute for Materials Science |
Common Data Processing System Version 7 |
|
CHO chae-ryong |
1 |
17 |
20 |
korea basic science institute, busan branch |
Elemental distribution measurement of sol-gel processed metal oxide films using Auger scanning mapping technique |
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