| This refernce material is utilized to optimize ion-sputtering conditions
in depth profoling measurements by Auger electron spectroscopy (AES), x-ray
photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS). |
| Example of Certification sheet(Now, in Japanese) |
| [Sample structure] The structure is shown in Fig. 1. This GaAs/AlAs superlattice structure was fabricated by MO-CVD (metal organic chemical vapor deposition) method on a GaAs substrate. |
 Fig.1 Sample structure |
| [Depth profiling] Fig. 2 shows an example of the depth profiling of this sample by AES. |
 Fig. 2 Example of AES depth profiling |
| [Sample size] 10 mm x 10 mm [Price] 80,000 Japanese YEN (including domestic/overseas mailing fee) MASTER/VISA card available [Inquiry] Surface Analysis Society of Japan URL:http://www.sasj.jp/ E-MAIL:standard-material@sasj.jp |
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[Material producer/certifying body] |