Invited speakers

Invited speakers

A beautiful picture from Gyeongju.

Excellent invited talks are scheduled to make the PSA-10 International Symposium more effective in the exchange of information, taking into account the importance of both the practical and fundamental researches in surface analysis.


Plenary Talk

R. Shimizu
(International Institute for Advanced Studies, Japan)
45 years in Monte Carlo simulation for microbeam analysis -a personal retrospective review-
D. Baer
(Pacific Northwest National Laboratory, USA)
Surface characterization of nanoparticles: critical needs and significant challenges

Standardization

I. Gilmore
(National Physical Laboratory, UK)
The development of a standards base for static SIMS –now and the future-
K. J. Kim
(Korean Research Institute of Standards and Science, Korea)
Improvement of uncertainty in surface analysis
C. J. Powell
(National Institute for Standards and Technology, USA)
Surface sensitivity of AES and XPS

Theory and simulation

Z. J. Ding
(University of Science and Technology of China, China)
Simulation of particle scattering from solid surfaces by using Bohmian quantum trajectory method
S. Tougaard
(University of Southern Denmark, Denmark)
Nano-structure information from XPS; automated data analysis and 3D-imaging
W. S. M. Werner
(Vienna University of Technology, Austria)
Progress in quantitative interpretation of electron spectra for surface and nanostructure analysis

Data analysis and treatment

J. Castle
(University of Surrey, UK)
Auto interpretation of XP spectra
A. Jablonski
(Polish Academy of Sciences, Poland)
The backscattering correction factor revisited
B. J. Tyler
(University of the West Indies, Republic of Trinidad and Tobago)
Critical issues in multivariate analysis of ToF-SIMS spectra, images and depth profiles
H. Yoshikawa
(National Institute for Materials Science, Japan)
Energy loss functions and optical constants of semiconductors determined by factor analysis of reflection electron energy loss spectra

Novel techniques and instrumentation

J. Matsuo
(Kyoto University, Japan)
Novel primary ion beams for bio-SIMS
J. W. Park
(Postech Biotech R&D Center, Korea)
Force-based AFM for biomarker detection

Application I (semiconductor, metal, ceramics, composite, etc.)

J. Hemminger
(University of California at Irvine, USA)
Ambient pressure XPS and liquid-jet XPS experiments: Probing the liquid/vapor interface of aqueous solutions
L. P. H. Jeurgens
(Max-Planck-Institut fur Metallforschung, Germany)
In-situ, real-time investigations of the growth of ultrathin oxide films
K. Kobayashi
(National Institute for Materials Science, Japan)
Application of hard x-ray photoelectron spectroscopy as a bulk sensitive probe
P. Lejeck
(Academy of Sciences of the Czech Republic, Czech Republic)
Application of quantitative AES to interfacial segregation
K. Yanagiuchi
(TDK, Japan)
Study of the spin polarization of non-magnetic materials inserted into ferromagnetic materials by X-ray magnetic circular dichroism

Application II (bio, organic, and energy materials)

D. Castner
(University of Washington, USA)
Surface characterization of functionalized nanoparticles
T. G. Lee
(Korean Research Institute of Standards and Science, Korea)
Label-free nano-surface analyses of organic- and bio-conjugated biochips and nanoparticles
Y. C. Ling
(National Tsing Hua University, Taiwan)
ToF-SIMS imaging of cellular changes induced by ZnO-containing nanomaterials
C. Mahoney
(National Institute for Standards and Technology, USA)
Surface and in-depth characterization of polymer-based drug delivery devices with cluster Secondary Ion Mass Spectrometry
R. Reedy
(National Renewable Energy Laboratory, USA)
The application of SIMS in photovoltaic research and development at NREL

Korea-Japan-China special session

A. Alkafri
(1National Standards and Calibration Laboratory, Syria)
Thermionic emission for the energy calibration and transmission measurements for the CMA in the absolute AES
T. Ogiwara
(National Institute for Materials Science, Japan)
High depth resolution Auger depth profiling using a 85-deg-high-angle inclined holder
M. Takano
(Panasonic Electronic Devices Co.,Ltd., Japan)
Evaluation of the Ni diffusion to the surface of Au plating for soldering process control