Committee members

Committee members


Organizing Committee

M. Suzuki
(Chair)
ULVAC-PHI, Japan
H. J. Kang
(Co-Chair)
Chungbuk National Univeristy, Korea
Japanese members
D. Fujita
NIMS
Y. Fukuda
Shizuoka University
K. Goto
AIST
S. Hayashi
Nippon Steal
Y. Homma
Tokyo Univ. of Sci.
S. Ichimura
AIST
J. Kawai
Kyoto Univ.
M. Kudo
Seikei Univ.
K. Miura
Tokuyama
S. Suzuki
Tohoku Univ.
S. Tanuma
NIMS
K. Yoshihara
NIMS
Korean members
J. S. Bae
KBSI
H. J. Kim
Hynix Semiconductor
J. N. Kim
RIST
J. S. Kim
Samsung Electronics
J. W. Kim
KRISS
J. C. Lee
Samsung Electronics
J. W. Lee
Hallym Univ.
Y. H. Lee
KIST
D. W. Moon
KRISS

Executive Committee

S. Hashimoto
(Chair)
JFE-Techno-Research, Japan
K. J. Kim
(Co-Chair)
Korea Research Institute of Standards and Science, Korea
K. Yanagiuchi
(Vice-Chair)
TDK, Japan
T. G. Lee
(Vice-Chair)
KRISS, Korea
Japanese members
N. Ishikawa
NIMS
H. Inomata
NSG Techno-Research
M. Inoue
Setsunan Univ.
N. Ishizu
Panasonic Corporation
H. Itoh
Konica Minolta Technology Center
H. Iwai
NIMS
M. Jo
AIST
M. Kimura
Nippon Mining & Metals
M. Nakamura
Fujitsu laboratories
W. Okawa
TDK
S. Ootomo
Furukawa Electric
T. Saito
Thermo Fisher Scientific
M. Sato
Fujitsu Quality Laboratory
Y. Sonobayashi
Kyoto Univ.
K. Takahashi
Shimadzu
M. Takano
Panasonic Electronic Devices
H. Tohma
Nissan Arc
K. Tsutsumi
JEOL
H. Watanabe
Hitachi Chemical Techno Service
H. Yoshikawa
NIMS
Korean members
J. S. Bae
KBSI
S. Y. Han
KRISS
S. J. Kang
KRISS
J. N. Kim
RIST
J. W. Kim
KRISS
J. W. Lee
Hallym Univ.
Y. J. Yi
KRISS

Program Committee

S. Tanuma
(Chair)
National Institute of Materials and Science, Japan
D. W. Moon
(Co-Chair)
Korea Research Institute of Standards and Science, Korea
Japanese members
Y. Abe
MCRC
Y. Fukuda
Shizuoka Univ.
S. Fukushima
NIMS
K. Goto
AIST
S. Hashimoto
JFE Techno-Research
Y. Homma
Tokyo Univ. of Science
T. Nagatomi
Osaka Univ.
M. Suzuki
ULVAC PHI
N. Suzuki
Utsunomiya Univ.
K. Yanagiuchi
TDK
K. Yoshihara
NIMS
Korean members
H. J. Kang
Chungbuk Univ.
J. N. Kim
RIST
K. J. Kim
KRISS
J. Lee
KBSI
J. C. Lee
Samsung Electronics
J. W. Lee
Hallym Univ.
T. G. Lee
KRISS
Y. H. Lee
KIST
Y. Park
Kyung Hee Univ.

Editorial Committee

Y. Abe
(Chair)
Mitsubishi Chemical Group Science and Technology Research Center, Japan
Y. Park
(Co-Chair)
Kyung Hee Univ., Korea
Japanese members
M. Inoue
Setsunan Univ.
H. Iwai
NIMS
M. Nakamura
Fujitsu laboratories
T. Nagatomi
Osaka Univ.
S. Ootomo
Furukawa Electric
N. Sanada
ULVAC-PHI
M. Sato
Fujitsu Quality Laboratory
M. Suzuki
ULVAC-PHI
K. Takahashi
Shimadzu
S. Tanuma
NIMS
H. Yoshikawa
NIMS
Korean members
J. S. Bae
KBSI
J. W. Kim
KRISS
J. C. Lee
Samsung Electronics
J. W. Lee
Hallym Univ.
T. G. Lee
KRISS
Y. H. Lee
KIST

Symposium Secretary

J. Lee Korea Basic Science Institute, Korea
T. Nagatomi Osaka University, Japan

Audit

J. S. Kim Samsung Electronics, Korea
Y. H. Lee KIST, Korea
N. Suzuki Utsunomiya Univ., Japan

International Advisory Board

D. R. Baer Pacific Northwest National Laboratory, USA
I. S. Gilmore National Physical Laboratory, UK
J. T. Grant Dayton University, USA
S. Hofmann Max-Planck-Institute for Metals Research, Germany
A. Jablonski Polish Academy of Science, Poland
L. Kövér Institute of Nuclear Research of Hungarian Academy of Sciences (ATOMKI), Hungary
Y. C. Ling National Tsing Hua University, Taiwan
H. J. Mathieu École Polytechnique Fédérale de Lausanne, Switzerland
S. Tougaard University of Southern Denmark, Denmark