Contents of JSA Vol.15 No.3 (2009) 215 - 355

Extended Abstracts Book of The International Workshop for Surface Analysis and Standardization ’09 (iSAS-09)
(March 15-18, 2009, Okinawa Convention Center, Okinawa, Japan)


Extended Abstracts

Ion Beam Sputtering for High Resolution Depth Profiling
Non-Destructive Depth Profiling by XPS Peak Shape Analysis
Combination of High-Resolution RBS and Angle-Resolved XPS: Accurate Depth Profiling of Chemical States
Sputter Depth Profiling by SIMS; Calibration of SIMS Depth Scale Using Multi-layer Reference Materials
Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation
Organic Depth Profiling by Cluster Ion Sputter
Current Activities of SC4 Depth Profiling in ISO/TC201 Surface Chemical Analysis
Auger Depth Profiling Analysis Using an Inclined Holder
Depth Distribution Functions of Secondary Electron Production and Emission
Evaluation of Depth Distribution Function for AR-XPS using Synchrotron Radiation Hard X-ray
The Backscattering Factor for Systems with Non-uniform In-depth Profile
Recent Status of Thin Film Analyses by XPS
Applications of XPS on Nanoscale Material Research
Study of SiO powder by X-ray Photoelectron Spectroscopy Analysis
Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam
Direct and Real-Time Surface Analysis and Imaging of Biological Samples by Probe Electrospray
Depth Profiling of Polystyrene Using Charged Water Droplet Impact
Characterisation and Optimisation of a Polyatomic Ion Source for Organic Depth Profiling
Test of the Consistency of Angle Resolved XPS Data for Depth Profile Reconstruction using the Maximum Entropy Method
Nondestructive Depth Resolved Analysis by using Grazing Exit Fluorescence-Yield X-ray Absorption Spectroscopy
In-Depth Profile of Hf-Based Gate Insulator Films on Si Substrates Studied by Angle-Resolved Photoelectron Spectroscopy Using Synchrotron Radiation
Synchrotron Radiation Photoemission Spectroscopy for Native Oxide Layer on Vanadium and VCrTa
Metal/Organic Interface Analysis Based on Photoelectron Spectroscopy and its Application Studies on the Next Generation Electronic Devices
Depth Profiling of Perhydoropolysilazane Thin Film Using Multi Anode XPS Technique
An Improved Backscattering Correction Equation for Wide Analytical Conditions on Quantitative Auger Analysis
Calculation of Depth Distribution Functions for CuO and SiO2
Inelastic Scattering Cross Section of Si from Angular Dependent Reflection Electron Energy Loss Spectra
Oxygen Enhanced Surface Roughening of Si(111) Induced by Low Energy Xe+ Ion Sputtering
Influences of Measurement Conditions on Etching Rate of GaAs/AlAs Superlattice in Auger Electron Spectroscopy Sputter Depth Profiling
In-Situ Observation of the Reaction between Iron and Carbon in TEM
Diagnosis and Cleaning of Carbon Contamination on SiO2 Thin Film
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