Extended Abstracts Book of The International Workshop for Surface Analysis and Standardization ’09 (iSAS-09)
(March 15-18, 2009, Okinawa Convention Center, Okinawa, Japan)
Preface
H. Yoshikawa・・・・215
Extended Abstracts
Ion Beam Sputtering for High Resolution Depth ProfilingH. J. Kang,* D. W. Moon, and H.-I. Lee・・・・216
Non-Destructive Depth Profiling by XPS Peak Shape Analysis
S. Hajati* and S. Tougaard・・・・220
Combination of High-Resolution RBS and Angle-Resolved XPS: Accurate Depth Profiling of Chemical States
K. Nakajima,* K. Kimura, T. Conard and W. Vandervorst・・・・225
Sputter Depth Profiling by SIMS; Calibration of SIMS Depth Scale Using Multi-layer Reference Materials
K. J. Kim,* J. S. Jang, and T. E. Hong・・・・229
Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation
H. Itoh*・・・・235
Organic Depth Profiling by Cluster Ion Sputter
Y. Abe*・・・・239
Current Activities of SC4 Depth Profiling in ISO/TC201 Surface Chemical Analysis
M. Suzuki*・・・・243
Auger Depth Profiling Analysis Using an Inclined Holder
T. Ogiwara* and S. Tanuma・・・・246
Depth Distribution Functions of Secondary Electron Production and Emission
Z. J. Ding,* Y. G. Li, R. G. Zeng, S. F. Mao, P. Zhang and Z. M. Zhang・・・・249
Evaluation of Depth Distribution Function for AR-XPS using Synchrotron Radiation Hard X-ray
H. Yoshikawa,* H. Tanaka, M. Kimura, T. Ogiwara, T. Kimura, S. Fukushima,
K. Kumagai, S. Tanuma, M. Suzuki, and K. Kobayashi・・・・254
The Backscattering Factor for Systems with Non-uniform In-depth Profile
A. Jablonski*・・・・259
Recent Status of Thin Film Analyses by XPS
H. Iwai,* J. S. Hammond, and S. Tanuma・・・・264
Applications of XPS on Nanoscale Material Research
F. Liu,* Z. Zhao, L. Qiu, and L. Zhao・・・・271
Study of SiO powder by X-ray Photoelectron Spectroscopy Analysis
H. Tohma*・・・・274
Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam
S. Ninomiya,* K. Ichiki, H. Yamada, Y. Nakata, T. Seki, T. Aoki, and J. Matsuo・・・・275
Direct and Real-Time Surface Analysis and Imaging of Biological Samples by Probe Electrospray
K. Hiraoka,* L. C. Chen, D. Asakawa, S. Takeda, and T. Kubota・・・・279
Depth Profiling of Polystyrene Using Charged Water Droplet Impact
Y. Sakai,* Y. Iijima, R. Takaishi, D. Asakawa, and K. Hiraoka・・・・283
Characterisation and Optimisation of a Polyatomic Ion Source for Organic Depth Profiling
A. J. Roberts,* S. J. Hutton, C. J. Blomfield, I. Drummond, and S. C. Page・・・・287
Test of the Consistency of Angle Resolved XPS Data for Depth Profile Reconstruction using the Maximum Entropy Method
A. J. Roberts,* K. Macak and K. Takahashi・・・・291
Nondestructive Depth Resolved Analysis by using Grazing Exit Fluorescence-Yield X-ray Absorption Spectroscopy
K. Shinoda,* S. Sato, S. Suzuki, T. Uruga, H. Tanida, H. Toyokawa, Y. Terada, and Y. Takagaki・・・・295
In-Depth Profile of Hf-Based Gate Insulator Films on Si Substrates Studied by Angle-Resolved Photoelectron Spectroscopy Using Synchrotron Radiation
S. Toyoda,* H. Kumigashira, M. Oshima, G. L. Liu, Z. Liu, and K. Ikeda・・・・299
Synchrotron Radiation Photoemission Spectroscopy for Native Oxide Layer on Vanadium and VCrTa
Y. Teraoka,* A. Yoshigoe, and J. Harries・・・・303
Metal/Organic Interface Analysis Based on Photoelectron Spectroscopy and its Application Studies on the Next Generation Electronic Devices
J. H. Lee*・・・・307
Depth Profiling of Perhydoropolysilazane Thin Film Using Multi Anode XPS Technique
H. Watanabe,* E. Tadaoka, and M. Nomoto・・・・309
An Improved Backscattering Correction Equation for Wide Analytical Conditions on Quantitative Auger Analysis
S. Tanuma*・・・・312
Calculation of Depth Distribution Functions for CuO and SiO2
H. Shinotsuka,* H. Yoshikawa, and S. Tanuma・・・・317
Inelastic Scattering Cross Section of Si from Angular Dependent Reflection Electron Energy Loss Spectra
H. Jin,* H. Yoshikawa, H. Iwai, S. Tanuma, and S. Tougaard・・・・321
Oxygen Enhanced Surface Roughening of Si(111) Induced by Low Energy Xe+ Ion Sputtering
T. Miyagawa, K. Inoue, M. Inoue*・・・・325
Influences of Measurement Conditions on Etching Rate of GaAs/AlAs Superlattice in Auger Electron Spectroscopy Sputter Depth Profiling
T. Nagatomi,* T. Bungo, and Y. Takai・・・・329
In-Situ Observation of the Reaction between Iron and Carbon in TEM
N. Ishikawa,* T. Aoyagi, T. Kimura, K. Furuya, H.Harada, and T.Inami・・・・333
Diagnosis and Cleaning of Carbon Contamination on SiO2 Thin Film
A. Kurokawa, K. Odaka,* Y. Azuma, T. Fujimoto, I. Kojima・・・・337
Instructions to Authors
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JSA Contribution Form
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Copyright Transfer Agreement
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Regular Subscription Order Form
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Back Number Order Form
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Postscript
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