JSA Vol.11 No.2 Pages 58-61
Development of Fine-Pitch Four-Point Probe for High Spatial Resolution Sheet Resistance Measurement
Yoshiyuki Sato, 1 Toshiya Ogiwara, 1 Mineharu Suzuki, 1,
Tomoyasu Kikuchi2 and Shigeo Kiyota21NTT Advanced Technology Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198
2Kiyota Corporation, 2-32-12 Kaminakazato Kita-ku, Tokyo 114-0016
(Received: January 5 , 2004; Accepted: March 31, 2004)
Abstract
A 0.1-mm-pitch four-point probe for sheet resistance measurement is fabricated. Four probes are contacted to four metal leaf springs both mechanically and electrically. They are electrically separated by insulator films and sandwiched with these films. The probe tip is rounded by mechanical polishing preceded by electropolishing. Using this probe sheet resistances of various kind of samples are successfully measured. The validity of the measurement is confirmed by the comparison of the data to those from a conventional 1-mm-pitch probe. Spatial resolution as small as 0.5 mm is confirmed by measuring sheet resistance of uniformly phosphorus doped polysilicon films whose pattern size is 0.5×0.5 mm
2.
