Theory of Electronic Structure of Surfaces
Koki Saito* and Sei Fukushima**
(abstract)
*Teikyo University of Science and Technology
2525 Yatsusawa, Uenohara, Yamanashi 409-01, Japan
**National Institute for Research in Inorganic Materials
1-1 Namiki, Tsukuba, Ibaraki 305,JAPAN
Self-control of surface composition in materials
Michiko YOSHITAKE
(abstract)
National Research Institute for Metals
1-2-1, Sengen, Tsukuba 305
"Charging", A Basic Problem of X-ray Photoelectron Spectroscopy
Shigemi KOHIKI
(abstract)
Technology Development Center,Nagaoka University of Technology
Nagaoka, Niigata 940-21, Japan
Quantification of Trace Elements at Surface and Interface by Laser-Ionization
Sputtered Neutral Mass Spectrometry
Yasuhiro Higashi and Tetsuya Maruo
(abstract)
NTT Interdisciplinaly Research Laboratories,
3-9-11, Midori-cho, Musashino, Tokyo 180
Peak energy search program for XPS
Kaoru Sasakawa
(abstract)
Kobelco Research Institute, Inc.
1-5-5, Takatsukadai, Nishi-ku, Kobe, Hyogo 651-22
AN EFFECT OF SILICON SURFACE TREATMENTS ON THIN SILICON NITRIDE GROWTH
Makoto Nakamura
(abstract)
FUJITSU LTD MATERIAL DEPARTMENT PROCESS DEVELOPMENT DIVISION
4-1-1, KAMIKODANAKA NAKAHARA-KU, KAWASAKI 211-88
General ASCII format for spectrum data
Masatoshi Jo
(abstract)
Eltectrotechnical Laboratory
Umezono 1-1-4, Tsukuba, Ibaragi 305, Japan
Surface Structure of Solids by LEED and RHEED
Satoru KISHIDA and Heizo TOKUTAKA
(abstract)
Department of Electrical and Electronic Engineering. Tottori University
4-101 Minami, Koyama, Tottori 680, Japan
Medium energy Ion Scattering Spectroscopy for Quantitative and Ultra-High Resolution Depth Profiling:Possibilities and Problems
Dae Won Moon, Hyun Kyung Kim, Kyung Joong Kim
Surface Analysis Groupbr
Korean Research Institute of Standards and Science
Yousoung P.O. 102, Taejon 305-606, Korea
Fe Auger Spectrum Measurement while Ion Sputtering
Mitsuo Koizumi* and Metal Materials Group
*Central Research Institute, Mitsubishi Materials Corporation,
1-297 Kitabukkuro, Omiya, Saitama 330
Activity Report of Metal Materials Group:
Survay of contamination signals in AES and XPS spectra
Masayasu NAGOSHI, Kokan Keisoku K.K.
(abstract)
1-1, Minamiwatarida, Kawasaki 210, Japan
and Metal Materials Group of Surface Analysis Society of Japan
Effects of simultaneous Ar+ion sputtering during XPS mesurments on the spectra for iron
Nobuya Okude* and Metal Material's Group
(abstract)
*Applied Technology Research Center, NKK Corporation
1-1 Minamiwatarida-cho, Kawasaki-ku, Kawasaki 210, JAPAN
Title:Energy Calibration of X-ray Photoelectron Spectrometers:
Results of an Interlaboratory Comparison to Evaluate a Proposed Calibration
Authors:C .J. Powell, NIST, USA
Published journal:Surface and Interface Analysis, 23, 121(1995)
Translated by Kazuhiko Dohmae (Toyota CRDL),
Mineharu Suzuki (NTT)
XPS Study of Bi-based Superconductors Heated in Air
A.Shibasaki, S.kishida, H.Tokutaka, K.Fujimura, H.Naoe
Tottori Univ, 4-101, Kayama, Tottori 680
Measurements of Plasmon Loss Spectra Originated by Elastic Sccatering Electrons
Mineharu Suzuki and Kadena Mogi*
(abstract)
NTT Interdisciplionary Research Laboratories, 3-1 Morinosato-wakamiya,
Atsugi, Kanagawa 243-01
*NTT Advanced Technology Corporation, 3-1 Morinosato-Wakamiya, Atsugi,
Kanagawa 243-01
Application of sputter-induced reduction to determin the binding energy of Pb oxides
Masayasu Nagoshi
Kokan Keisoku K.K., 1-1 Minamiwatarida, Kawasaki 210, Japan
Residual Impurity and Depth resolution in AlAs/GaAs Alternating Layered Film
Mikio Furuya*, Hiromichi Takano**
*Kanagawa Industrial Technology research Institute,
705-1 Shimoimaizumi,Ebina-shi, 243-04
**Kanagawa High-Technology Foundation, 3-2-1 Sakado Takatsu-ku,
Kawasakishi, 213
A Practical Auger Depth Profiling Analysis Method with a Depth Resolution Function.
T.Ogiwara and S.Tanuma
Japan Energy Analytical research Center Co.Ltd.
3-17-35 Niizo-Minami, Toda, Saitama 335
SIMS Analysis of a Small Area using FIB
T.Yamamoto, T.Yamamoto, S.Tomita, M.Hatada, K.Okuno, H.Isida, A.Isitani
Toray Research Center,Inc. 3-7 Sonoyama 3-Chome, Otsu, Siga 520
SIMS Depth Profiling of Na in SiO2 films by Chemical etching with HF Solution
Reiko Watanabe* and Masahiro Kudo**
*Manufacturing engineering Research Center, TOSHIBA Corporation,
33, Shin-isogo-dho, Isogo-ku, Yokohama 235
**Department of Applied Physics, Faculty of Engineering,
Seikei University, 3-3-1, Kichijo-ji-kitamachi, Musashino 180
Secondary Ion Emission from Langmulr-Blodgett film on a Silicon Substrate
S.Yamada*, M.Kudo*, S.Yoshida**, T.Watanabe** and T.Hoshi***
*Seikei Univ., 3-3-1, Kitamachi, Kichijyoji, Musashino-shi, Tokyo 180
**Univ. of tokyo, 7-22-1, Roppongi, Minato-ku, Tokyo 106
***ULVAC-PHI,INC., 2500, Hagisono, Chigasaki-shi, Kanagawa 253
Estimation of IMFPs in Solids from Absolute Electron Elastic Scattering Spectroscopy
S.tanuma*, S.Ichimura**, and K.Goto**
*Japan Energy ARC.Co.Ltd., 3-17-35 niizo-Minami, Toda, Saitama 335
**Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305
***Nagoya Institute of Technology, Gokiso-chou, Showa-ku, Nagoya 466
Oxygen depth profiling of H2-annealed Si wafer by SIMS
Koyo Fukuyama
Central Research Institute, Mitsubisi Materials Corporation
1-297 Kitabukuro-cho, Omiya 330
Auger Spectrum Measurement while Sputtering
Mitsuo Koizumi and Kazuo Ishikawa
Central Research Institute, Mitsubisi Materials Corporation
1-297 Kitabukuro-cho, Omiya, Saitama 330
Dependency of Species, Energy, Incident Angle of Primary Ion Beam In Fragment Pattern of Thin-Film Magnetic Tape
by Time-of-Flight Secondary Ion Mass Spectrometry
Miyako Tozu* **, Takahiro Hoshi * **
*ULVAC-PHI, 2500, Hagizono, Chigasaki
**New SIMS, 3-3-1, Kichijo-ji-Kitamachi, Musashino 180
AES Crater-edge Line Profiling for Small Area
Atsuko Kojima
Matsushita Technoresearch Inc.
3-3-1, Yagumo-Nakamachi, Moriguchi, Osaka
Standard Auger Electron Spectra(Au, Ag, and Cu)
Y.Takeichi and K.Goto
Nagoya Institute of Technology
Effects of surface contaminations and simultaneous Ar+ion sputtering during XPS mesurments on the spectra for iron
Nobuya Okude
Applied Technology Research Center, NKK Corporation
1-1 Minamiwatarida-cho, Kawasaki-ku, Kawasaki 210, JAPAN
Influence of oxygen adsorption and ion bombardment on the state and composition of the clean surface of K2CrO4
Shigeru Suzuki*, Masaoki Oku**, Toshio Sato* and Yoshio Waseda*
*Institute for Advanced Materials Processing,
**Institute for Materials Research
Tohoku University,2-1-1 Katahira, Sendai 980-77
Background subtraction from First transition Metal 2p XPS spectra by Deconvolution using XPS spectra of other element being in sample
Masaoki Oki, Kazuaki Wagatsuma, and Hideyuki Matsuta
Institute for Material Research, Tohoku University,
2-1-1, Katahira, Aobaku, Sendai 980-77
Effects of Oxygen Introduction on the CsM + Formation on Several Metal Surfaces
Sukenori Ichikawa, Masayasu Nagoshi
Kokan Keisoku K.K. 1-1 Minamiwataridacho, Kawasaki-ku, Kawsaki 210
XPS Chemical Shifts for Some Binary Oxides
Masahiro Arai, Tadao Ishii and Noriaki Usuki
Corporate R & D Lads., Sumitomo Metal Industries, LTD.
1-8 Fuso-cho Amagasaki 660
Binding Energy Shift of Metal Particles on Oxide Surfaces
Noritake Isomura, Kazuhiko Dohmae, Yoshiharu Hirose, Mareo Kimura
Toyota Central R&D Labs., inc.
41-1, Yokomichi, Nagakute, Ngakute-cho, Aichi-gun, Aichi-ken 480-11
SIMS Quantification for High-dose BF2+ -implanted Silicon
Yoko Tada, Yuji Kataoka
FUJITSU LABS. LTD., 10-1, Morinosato-Wakamiya, Atsugi 243-01
A Study of Elastic Scattering Effects on Asymmetrical Distribution of X-ray Photoelectron Emission(II)
H.Satho*1, A.Tanaka*1, S.Ichimura*2, M.Jo*2, S.Tanuma*3, K.Yoshihara*4
(abstract)
*1 ULVAC-PHI Inc., 2500 Hagisono Chigasaki 253, Kanagawa Japan
*2 Electrotechnical Laboratory, 1-1-4 Unesono Tsukuba 305,
Ibaraki Japan
*3 Japan Energy Analysis Center Inc.,
3-17-35 Niizominami Toda 335, Saitama Japan
*4 National Research Institute for Metals,
1-2-1 Sengen Tsukuba 305, Ibaraki Japan
Study of Transmission Correction for XPS
Kazuhiko Dohmae*, Akihiro Tanaka**
* Toyota Central R & D Lab., Nagakute, Aichi, 480-11, Japan
** ULVAC-PHI INC. 2500 Hagisono, Chigasaki, Kanagawa, 253 Japan
Simulation of core-level Cls spectra of polymers in XPS
Kazunaka Endo and Shigehiro Maeda
Mitsubishi Paper Mills LTD., Tsukuba Research Laboratory
46 Wadai, Tsukuba-city, Ibaraki 300-42
AES Crater-edge Line Profiling for Small Area
Atsuko Kojima
Matsushita Technoresearch Inc.
3-3-1, Yagumo-Nakamachi, Moriguchi, Osaka
Report of 5th Meeting of Inorganic Materials Group
Repoted by Ohtuka(ULVAC), Dohmae(Toyota CRDL)
Report of 5th Meeting of Metal Materials Group
Witten by M.Nagoshi